論文

2013年

Resonant Gate Driver for Normally-On GaN High-Electron-Mobility Transistor

2013 IEEE ECCE ASIA DOWNUNDER (ECCE ASIA)
  • Takaharu Ishibashi
  • ,
  • Masayuki Okamoto
  • ,
  • Eiji Hiraki
  • ,
  • Toshihiko Tanaka
  • ,
  • Tamotsu Hashizume
  • ,
  • Tetsu Kachi

開始ページ
365
終了ページ
371
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
出版者・発行元
IEEE

Wide bandgap semiconductors, such as silicon carbide (SiC) and gallium nitride (GaN), are promised materials for next-generation power devices. The authors have recently fabricated a GaN-based high-electron-mobility transistor (HEMT), which is a normally-on device, for power electronics application. However, the power consumption in the constructed gate drive circuit increases when the GaN HEMT is used under higher-frequency operation. A new gate drive circuit with lower power consumption for the normally-on GaN HEMT is strongly required. In this paper, a new resonant gate drive circuit, which is most suitable for the newly fabricated GaN HEMT, is proposed. The validity and high practicability of the proposed resonant gate drive circuit are demonstrated by simulation and experimental results.

リンク情報
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000332789100058&DestApp=WOS_CPL
ID情報
  • Web of Science ID : WOS:000332789100058

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