MISC

2016年3月

Si中Cu,Niの熱的振る舞い:フォトルミネッセンス/DLTS測定

表面科学
  • 中村 稔
  • ,
  • 村上 進
  • ,
  • 鵜殿 治彦

37
3
開始ページ
128
終了ページ
133
記述言語
日本語
掲載種別
記事・総説・解説・論説等(学術雑誌)
DOI
10.1380/jsssj.37.128
出版者・発行元
公益社団法人 日本表面科学会

The influence of diffusion temperature on the formation of one type of Cu center denoted as CuDLB center, the relationship between the concentrations of the CuDLB center after the diffusion of Cu and those of contaminated Cu on sample surfaces, and the transformation of the CuDLB center to another type of Cu center denoted as the CuDLA center by annealing were investigated by photoluminescence and deep-level transient spectroscopy (DLTS) measurements. It was found that the CuDLB center is composed of one core Cu atom and weakly bonded three interstitial Cu atoms around the core and that the CuDLA center is the core of the CuDLB center. For Ni, the depth profiles of the substitutional Ni (Ni center) in silicon diffused with various concentrations of the element were measured by DLTS, and were found to be controlled by the temperature-dependent outdiffusion of Ni.

リンク情報
DOI
https://doi.org/10.1380/jsssj.37.128
CiNii Articles
http://ci.nii.ac.jp/naid/130005138639
CiNii Books
http://ci.nii.ac.jp/ncid/AN00334149
ID情報
  • DOI : 10.1380/jsssj.37.128
  • ISSN : 0388-5321
  • CiNii Articles ID : 130005138639
  • CiNii Books ID : AN00334149

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