In this study, an experimental system for in-situ observation of the thermal imprint process was constructed, and the material behavior from the initiation of transcription to product removal was precisely studied. Based on the results obtained, effect of the temperature and pressure on the transcription behavior and the shape accuracy was investigated, and the principles to obtain good replication were discussed. In addition, the exfoliation behavior of the material from substrate in the cooling stage after the transcription was observed and its characteristics were discussed. © 2010 The Institute of Electrical Engineers of Japan.