東康史 (Yasushi Azuma) - マイポータル

基本情報

所属: 独立行政法人産業技術総合研究所計測標準研究部門先端材料科材料評価研究室

J-GLOBAL ID: 200901095000427917
researchmap会員ID: 5000086449

外部リンク: http://www.aist.go.jp/RESEARCHERDB/cgi-bin/worker_detail.cgi?call=namae&rw_id=Y39555564

論文

Determination of the Avogadro constant by the XRCD method using a Si-28-enriched sphere

Naoki Kuramoto, Shigeki Mizushima, Lulu Zhang, Kazuaki Fujita, Yasushi Azuma, Akira Kurokawa, Sho Okubo, Hajime Inaba, Kenichi Fujii

METROLOGIA 54(5) 716-729 2017年10月査読有り
Realization of the Kilogram Based on the Planck Constant at NMIJ

Naoki Kuramoto, Lulu Zhang, Shigeki Mizushima, Kazuaki Fujita, Yasushi Azuma, Akira Kurokawa, Kenichi Fujii

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 66(6) 1267-1274 2017年6月査読有り
Surface Layer Analysis of a Si-28-Enriched Sphere Both in Vacuum and in Air by Ellipsometry

Kazuaki Fujita, Naoki Kuramoto, Yasushi Azuma, Shigeki Mizushima, Kenichi Fujii

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 66(6) 1283-1288 2017年6月査読有り
Thickness Measurement of Oxide and Carbonaceous Layers on a Si-28 Sphere by XPS

Lulu Zhang, Naoki Kuramoto, Yasushi Azuma, Akira Kurokawa, Kenichi Fujii

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 66(6) 1297-1303 2017年6月査読有り
Volume measurements of Si-28-enriched spheres using an improved optical interferometer for the determination of the Avogadro constant

Naoki Kuramoto, Yasushi Azuma, Hajime Inaba, Kenichi Fujii

METROLOGIA 54(2) 193-203 2017年4月査読有り
Thickness Measurements of Oxide and Carbonaceous Layer on a Si-28 Sphere by Using XPS

Lulu Zhang, Naoki Kuramoto, Yasushi Azuma, Akira Kurokawa, Kenichi Fujii

2016 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS (CPEM 2016) 2016年査読有り
Realization of the Kilogram Based on the Planck Constant at NMIJ

Naoki Kuramoto, Lulu Zhang, Shigeki Mizushima, Kazuaki Fujita, Yasushi Azuma, Akira Kurokawa, Kenichi Fujii

2016 CONFERENCE ON PRECISION ELECTROMAGNETIC MEASUREMENTS (CPEM 2016) 2016年査読有り
Application of a GaAs/InGaP superlattice in nanometric lateral scales

Ichiko Misumi, Satoshi Gonda, Osamu Sato, Kentaro Sugawara, Kazunori Yoshizaki, Toshiyuki Takatsuji, Yasushi Azuma, Toshiyuki Fujimoto, Tomizo Kurosawa

MEASUREMENT SCIENCE AND TECHNOLOGY 18(9) 2743-2749 2007年9月査読有り
Density determination of silicon spheres using an interferometer with optical frequency tuning

Naoki Kuramoto, Kenichi Fujii, Yasushi Azuma, Shigeki Mizushima, Yasutake Toyoshima

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 56(2) 476-480 2007年4月査読有り
Development of a photon correlation spectroscopy instrument to measure size distributions of nanoparticles

Tetsuji Yamaguchi, Yasushi Azuma, Kikuo Okuyama

PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION 23(2) 188-192 2006年8月査読有り
Comparative study of the interfacial characteristics of sputter-deposited HfO2 on native SiO2/Si (100) using in situ XPS, AES and GIXR

RQ Tan, Y Azuma, Kojima, I

SURFACE AND INTERFACE ANALYSIS 38(4) 784-788 2006年4月
Reliability of parameters of associated base straight line in step height samples: Uncertainty evaluation in step height measurements using nanometrological AFM

Misumi, I, S Gonda, T Kurosawa, Y Azuma, T Fujimoto, Kojima, I, T Sakurai, T Ohmi, K Takamasu

PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY 30(1) 13-22 2006年1月
Cleaning method for thickness metrology of SiO2 thin films on Si substrates by heating in atmosphere

Y Azuma, T Fujimoto, Kojima, I

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 44(11) 8256-8258 2005年11月
Physical structures of SiO2 ultrathin films probed by grazing incidence x-ray reflectivity

Y Azuma, JW Fan, Kojima, I, S Wei

JOURNAL OF APPLIED PHYSICS 97(12) 123522-23526 2005年6月
Influence of thickness of Hf buffer layer on the interfacial structures of sputtered HfO2 on SiO2/Si

RQ Tan, Y Azuma, Kojima, I

APPLIED SURFACE SCIENCE 244(1-4) 21-25 2005年5月
X-ray photoelectron spectroscopic analysis of HfO2/Hf/SiO2/Si structure

RQ Tan, Y Azuma, Kojima, I

APPLIED SURFACE SCIENCE 241(1-2) 135-140 2005年2月
Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V. Results of a CCQM pilot study

MP Seah, SJ Spencer, F Bensebaa, Vickridge, I, H Danzebrink, M Krumrey, T Gross, W Oesterle, E Wendler, B Rheinlander …

SURFACE AND INTERFACE ANALYSIS 36(9) 1269-1303 2004年9月
Preparation of ultrathin HfO2 films and comparison of HfO2/SiO2/Si interfacial structures

RQ Tan, Y Azuma, T Fujimoto, JW Fan, Kojima, I

SURFACE AND INTERFACE ANALYSIS 36(8) 1007-1010 2004年8月
R & D of thin film certified referenced materials

SMAM-1 proceeding 165-168 2004年
Suppression of interfacial diffusion by a predeposited Hf metal layer on SiO2/Si

RQ Tan, Y Azuma, Kojima, I

APPLIED SURFACE SCIENCE 222(1-4) 346-350 2004年1月

もっとみる