2013年12月1日
Microfabrication of lead-free (K, Na)NbO<inf>3</inf>piezoelectric thin films by dry etching
2013 Transducers and Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS 2013
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- 記述言語
- 英語
- 会議種別
In this study, we propose a practical microfabrication method of lead-free sodium potassium niobate [(K, Na)NbO3, KNN] thin films by dry etching for the first time. We found that Ar/C4F8plasma etching was very effective for high etching rate of KNN thin film as well as excellent selectivity of KNN and Cr metal mask. We successfully fabricated unimorph micro-cantilevers of KNN thin films without process damage and confirmed excellent piezoelectric properties of the microfabricated KNN thin film. These results indicate that Ar/C4F8plasma etching enables to fabricate various lead-free piezoelectric MEMS applications. © 2013 IEEE.
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