論文

査読有り
2012年12月

Micro fabrication of lead-free (K, Na) NbO3 piezoelectric thin films by dry etching

MICRO & NANO LETTERS
  • F. Kurokawa
  • ,
  • R. Yokokawa
  • ,
  • H. Kotera
  • ,
  • F. Horikiri
  • ,
  • K. Shibata
  • ,
  • T. Mishima
  • ,
  • M. Sato
  • ,
  • I. Kanno

7
12
開始ページ
1223
終了ページ
1225
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1049/mnl.2012.0570
出版者・発行元
INST ENGINEERING TECHNOLOGY-IET

Micro fabrication has been conducted for sodium potassium niobate [(K, Na) NbO3, KNN] thin films by dry etching and Pt/KNN/Pt unimorph micro cantilevers have been fabricated as a lead-free piezoelectric micro electro mechanical system (MEMS). KNN etching by Ar/C4F8 plasma showed a high etching rate of about 60 nm/min and KNN/Cr selectivity of over 5. Tip displacement of the Pt/KNN/Pt micro cantilevers was measured and the frequency response and piezoelectric properties were evaluated. Young's modulus and piezoelectric coefficients d(31) of the KNN thin film were estimated to be 115 GPa and -99 to 219 pm/V, respectively. These results indicate that Ar/C4F8 plasma etching does not degrade the piezoelectric properties of KNN thin films and enables one to fabricate various lead-free piezoelectric MEMS applications.

リンク情報
DOI
https://doi.org/10.1049/mnl.2012.0570
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000316949900019&DestApp=WOS_CPL
ID情報
  • DOI : 10.1049/mnl.2012.0570
  • ISSN : 1750-0443
  • Web of Science ID : WOS:000316949900019

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