2012年12月
Micro fabrication of lead-free (K, Na) NbO3 piezoelectric thin films by dry etching
MICRO & NANO LETTERS
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- 巻
- 7
- 号
- 12
- 開始ページ
- 1223
- 終了ページ
- 1225
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1049/mnl.2012.0570
- 出版者・発行元
- INST ENGINEERING TECHNOLOGY-IET
Micro fabrication has been conducted for sodium potassium niobate [(K, Na) NbO3, KNN] thin films by dry etching and Pt/KNN/Pt unimorph micro cantilevers have been fabricated as a lead-free piezoelectric micro electro mechanical system (MEMS). KNN etching by Ar/C4F8 plasma showed a high etching rate of about 60 nm/min and KNN/Cr selectivity of over 5. Tip displacement of the Pt/KNN/Pt micro cantilevers was measured and the frequency response and piezoelectric properties were evaluated. Young's modulus and piezoelectric coefficients d(31) of the KNN thin film were estimated to be 115 GPa and -99 to 219 pm/V, respectively. These results indicate that Ar/C4F8 plasma etching does not degrade the piezoelectric properties of KNN thin films and enables one to fabricate various lead-free piezoelectric MEMS applications.
- リンク情報
- ID情報
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- DOI : 10.1049/mnl.2012.0570
- ISSN : 1750-0443
- Web of Science ID : WOS:000316949900019