論文

査読有り
2014年

Hydrogen Interaction with Defects in Nanocrystalline, Polycrystalline and Epitaxial Pd Films

JOURNAL OF NANO RESEARCH
  • Jakub Cizek
  • Oksana Melikhova
  • Marian Vlcek
  • Frantisek Lukac
  • Martin Vlach
  • Patrik Dobron
  • Ivan Prochazka
  • Wolfgang Anwand
  • Gerhard Brauer
  • Stefan Wagner
  • Helmut Uchida
  • Ryota Gemma
  • Astrid Pundt
  • 全て表示

26
開始ページ
123
終了ページ
133
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.4028/www.scientific.net/JNanoR.26.123
出版者・発行元
TRANS TECH PUBLICATIONS LTD

Hydrogen interaction with defects and structural development of Pd films with various microstructures were investigated. Nanocrystalline, polycrystalline and epitaxial Pd films were prepared and electrochemically loaded with hydrogen. Structural changes of Pd films caused by absorbed hydrogen were studied by in-situ X-ray diffraction combined with acoustic emission and measurement of electromotorical force. Development of defects during hydrogen loading was investigated by positron annihilation spectroscopy. It was found that hydrogen firstly fills open volume defects existing already in the films and subsequently it occupies also interstitial sites in Pd lattice. Absorbed hydrogen causes volume expansion, which is strongly anisotropic in thin films. This introduces high stress into the films loaded with hydrogen. Acoustic emission measurements revealed that when hydrogen-induced stress achieves a certain critical level rearrangement of misfit dislocations takes place. The stress which grows with increasing hydrogen concentration can be further released by plastic deformation and also by detachment of the film from the substrate.

リンク情報
DOI
https://doi.org/10.4028/www.scientific.net/JNanoR.26.123
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000330816600018&DestApp=WOS_CPL
Scopus
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84891794179&origin=inward
Scopus Citedby
https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=84891794179&origin=inward
ID情報
  • DOI : 10.4028/www.scientific.net/JNanoR.26.123
  • ISSN : 1662-5250
  • eISSN : 1661-9897
  • SCOPUS ID : 84891794179
  • Web of Science ID : WOS:000330816600018

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