論文

査読有り
2013年9月14日

Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Advanced Materials
  • Cara M. Doherty
    • ,
  • Gianluca Grenci
    • ,
  • Raffaele Riccò
    • ,
  • James I. Mardel
    • ,
  • Julien Reboul
    • ,
  • Shuhei Furukawa
    • ,
  • Susumu Kitagawa
    • ,
  • Anita J. Hill
    • ,
  • Paolo Falcaro
巻
25
号
34
開始ページ
4701
終了ページ
4705
記述言語
英語
掲載種別
研究論文（学術雑誌）
DOI
10.1002/adma.201301383
Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices. Copyright © 2013 WILEY-VCH Verlag GmbH &amp
Co. KGaA, Weinheim.
リンク情報
DOI
https://doi.org/10.1002/adma.201301383
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000327692100006&DestApp=WOS_CPL
URL
http://orcid.org/0000-0003-3849-8038
ID情報
  • DOI : 10.1002/adma.201301383
  • ISSN : 0935-9648
  • ISSN : 1521-4095
  • ORCIDのPut Code : 48612371
  • SCOPUS ID : 84883827180
  • Web of Science ID : WOS:000327692100006
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