Papers

Peer-reviewed
May, 2014

Persistent insulator-to-metal transition of a VO2 thin film induced by soft X-ray irradiation

JAPANESE JOURNAL OF APPLIED PHYSICS
  • Yuji Muraoka
  • ,
  • Hiroki Nagao
  • ,
  • Shinsuke Katayama
  • ,
  • Takanori Wakita
  • ,
  • Masaaki Hirai
  • ,
  • Takayoshi Yokoya
  • ,
  • Hiroshi Kumigashira
  • ,
  • Masaharu Oshima

Volume
53
Number
5
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.7567/JJAP.53.05FB09
Publisher
IOP PUBLISHING LTD

We present a persistent soft-X-ray-induced insulator-to-metal transition at room temperature for VO2 thin films. Continuous soft X-ray irradiation renders the insulating electronic state metallic in the VO2 thin films, which has been found by photoemission spectroscopy measurement. The observed transition is irreversible and the metallic state persists when soft X-ray irradiation is stopped. The analysis of valence band spectra reveals that the density of states (DOS) of the V 3d band increases with irradiation time, while the DOS of the O 2p band decreases. We propose a simple model where the persistent insulator-to-metal transition is driven by oxygen desorption from VO2 thin films under soft X-ray irradiation. The present results will help in developing a new route for controlling the phase transition of VO2 by light. (C) 2014 The Japan Society of Applied Physics

Link information
DOI
https://doi.org/10.7567/JJAP.53.05FB09
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000338316200023&DestApp=WOS_CPL
ID information
  • DOI : 10.7567/JJAP.53.05FB09
  • ISSN : 0021-4922
  • eISSN : 1347-4065
  • Web of Science ID : WOS:000338316200023

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