2019年
Fabrication of nano-and micro-structured surface using spatial beat of evanescent wave interference lithography
European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 19th International Conference and Exhibition, EUSPEN 2019
- ,
- ,
- ,
- 開始ページ
- 100
- 終了ページ
- 101
- 記述言語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
© 2019 European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 19th International Conference and Exhibition, EUSPEN 2019. All rights reserved. In the last few decade nano- and micro-structured surfaces have been attracting great attention in various fields represented by biomimetics. Because it becomes clear that multi-scale structures have multiple functions such as several hundred nm for antireflection and several tens of μm for superhydrophobic. In this paper, we present a fabrication method for nano- and micro-structured surface using the spatial beat of evanescent wave interference lithography. The spatial beat of evanescent wave interference modulate visibility of interference fringes with micrometer period. Furthermore, unlike ordinary propagation light, the attenuation height is also modulated by the exponential decay of the evanescent wave. A four-beam evanescent wave interference lithography system was set up to demonstrate this method. As a result, we could successfully fabricate multi-scale structured surface combining nano-sized 1D gratings with the pitch of 450 nm aligned in a 2D elliptical dot patterns of several tens of microns. The results indicate multi-scale structures can be fabricated by this method.
- リンク情報
- ID情報
-
- ISBN : 9780995775145
- SCOPUS ID : 85070973612