2020年12月
Selective growth and texturing of VO2(B) thin films for high-temperature microbolometers
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
- 巻
- 40
- 号
- 15
- 開始ページ
- 5582
- 終了ページ
- 5588
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/j.jeurceramsoc.2020.05.052
- 出版者・発行元
- ELSEVIER SCI LTD
Vanadium oxides exhibit a broad spectrum of physical properties due to their ability to form various compounds and polymorphs. To utilise a particular property, it is essential to selectively synthesise a desired phase. Herein, we demonstrate a method to selectively and reproducibly grow (00l)-textured VO2(B) thin films using an amorphous SrTiO3 buffer layer by sputtering at 350 degrees C, which enables their direct integration with read-outintegrated-circuits (ROICs), glass, and polymer substrates. The VO2(B) films exhibit high temperature-coefficient-of-resistances (TCRs) ( -3.5%/K at 25 degrees C and >-1.5%/K at 95 degrees C) and low electrical resistivities (similar to 5 10(-1) Omega cm at 25 degrees C and < 1 x 10(-1) Omega cm at 95 degrees C), which are favourable for realising highly-sensitive, lownoise, and high-temperature microbolometers. A robust thermal stability of these VO2(B) thin films at ambient pressure will provide new opportunities to incorporate thermal sensing functions to various electronics.
- リンク情報
- ID情報
-
- DOI : 10.1016/j.jeurceramsoc.2020.05.052
- ISSN : 0955-2219
- eISSN : 1873-619X
- Web of Science ID : WOS:000564251700004