2016年10月1日
Incorporation of terbium(III) ion into mesoporous silica particles
Jpn. J. Appl. Phys.
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- 巻
- 55
- 号
- 10
- 開始ページ
- 105503
- 終了ページ
- 105503
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.7567/jjap.55.105503
- 出版者・発行元
- Institute of Physics
Terbium(III)-doped mesoporous silicas were synthesized, and the states of terbium ions in the silica frameworks were investigated. The mesopores were preserved upon doping at terbium ion molar concentrations relative to (Si+Tb) up to 15 mol %, indicating the interaction of terbium ions with Si–O bonds. Significant morphological changes of the particles were observed with increasing the doping concentration. The shapes of the photoluminescence spectra due to the transitions of 5D<inf>4</inf>→ 7F<inf>6</inf>and 5D<inf>4</inf>→ 7F<inf>5</inf>were indicative of the presence of terbium ions in the silica matrix, and the quantum efficiency (2.1–2.8%) and lifetime (1.6–1.9 ms) decreased with increasing the doping concentration up to 15 mol %. Therefore, the terbium ions are considered to be located inside the amorphous silica frameworks, where they electrostatically interact with the O atoms of silanol and siloxane groups.
- リンク情報
- ID情報
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- DOI : 10.7567/jjap.55.105503
- ISSN : 0021-4922
- eISSN : 1347-4065
- CiNii Articles ID : 150000113182