論文

査読有り
2016年

An Alternative Resource for Technology Innovation: Do Industrial Designers Create Superior Invention?

PORTLAND INTERNATIONAL CONFERENCE ON MANAGEMENT OF ENGINEERING AND TECHNOLOGY (PICMET 2016): TECHNOLOGY MANAGEMENT FOR SOCIAL INNOVATION
  • Tohru Yoshioka-Kobayashi
  • ,
  • Toshiya Watanabe

開始ページ
836
終了ページ
854
記述言語
英語
掲載種別
研究論文(国際会議プロシーディングス)
DOI
10.1109/PICMET.2016.7806721
出版者・発行元
IEEE

Recent design studies have advocated how design practices enhance innovation in various fields. Indeed, the latest case study discovered that industrial designers can contribute even in natural science research. On the other hand, the majority of R&D management scholars and practitioners have long overlooked the value of collaboration between R&D engineers and industrial designers. To fill the gap, in this study, we test the link between an enrollment of industrial designers in inventing activities and their impacts on inventing outcomes using patent applications to Japan Patent Office from a Japanese electronics manufacturer. By connecting each inventor's individual affiliation information collected from the design patent, we constructed 75,932 invention-level data points for inventor affiliations to use in our regression analysis. Our analysis reveals a significant contribution by industrial designers to high-impact inventions. Our estimation result shows that an enrollment of industrial designers increases forward citations of a focal patent application by an average of 17%. We can interpret that these contributions of industrial designers come from their latent demand-oriented thinking, which concurs with recent design studies. This study provides the implication for R&D managers that they should not exclude industrial designers when seeking to develop innovative technologies.

リンク情報
DOI
https://doi.org/10.1109/PICMET.2016.7806721
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000403104500080&DestApp=WOS_CPL
ID情報
  • DOI : 10.1109/PICMET.2016.7806721
  • ISSN : 2159-5100
  • Web of Science ID : WOS:000403104500080

エクスポート
BibTeX RIS