論文

査読有り
2005年5月

Chemical pressure effect for the SDW phase in heavy fermion Ce(Ru0.85Rh0.15)(2)Si-2 compound

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN
  • T Nakano
  • ,
  • H Yamashiro
  • ,
  • K Fujita
  • ,
  • S Murayama

74
5
開始ページ
1602
終了ページ
1608
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1143/JPSJ.74.1602
出版者・発行元
PHYSICAL SOC JAPAN

Susceptibility measurements have been performed on polycrystalline samples Ce1-xRy(Ru0.85Rh0.15)(2)(-) Si-2 (R = Sc, La) in order to clarify the chemical pressure effect for the SDW in the heavy fermion Ce(Ru0.85Rh0.15)(2)Si-2. Lattice parameters a and c both decrease with increasing Sc concentration and increase with increasing La concentration. For Ce1-yScy(Ru0.85Rh0.15)(2)Si-2 system, the Neel temperature T-N decreases with increasing Sc concentration and disappears for y >= 0.2. We observed the Curie-Weiss law in the susceptibility at high temperature and a tendency of the saturation in the low temperature susceptibility. The tendency of the saturation and the Weiss temperature Theta determined from the high temperature susceptibility increase with increasing Sc concentration. These facts can be explained through the increase of the c-f hybridization and itinerancy of the f electron. For Ce1-yLay(Ru-0.85-Rh-0.15)(2)Si-2 system, the T-N slightly decreases with increasing La concentration and the tendency of the saturation becomes weaker with increasing y and is no more observed down to T-N for y > 0. 15. The Theta rapidly decreases with increasing La concentration and becomes almost zero for 37 > 0.15. These facts suggest that the c-f hybridization becomes weak with increasing y and that the itinerant AF phase for y < 0. 15 is replaced by the AF phase with the localized moment for y > 0. 15. The Kondo temperature T-K estimated from Theta is scaled by a single proportional function of the lattice parameter c in both cases for the Sc and La substitution.

リンク情報
DOI
https://doi.org/10.1143/JPSJ.74.1602
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000229294400046&DestApp=WOS_CPL
ID情報
  • DOI : 10.1143/JPSJ.74.1602
  • ISSN : 0031-9015
  • Web of Science ID : WOS:000229294400046

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