論文

査読有り
2018年6月

Tailoring a Thermally Stable Amorphous SiOC Structure for the Separation of Large Molecules: The Effect of Calcination Temperature on SiOC Structures and Gas Permeation Properties

ACS OMEGA
  • Hiroki Inde
  • ,
  • Masakoto Kanezashi
  • ,
  • Hiroki Nagasawa
  • ,
  • Toshimi Nakaya
  • ,
  • Toshinori Tsuru

3
6
開始ページ
6369
終了ページ
6377
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1021/acsomega.8b00632
出版者・発行元
AMER CHEMICAL SOC

A SiOC membrane with high oxidative stability for gas separation was tailored by utilizing vinyltrimethoxysilane, triethoxysilane, and 1,1,3,3-tetramethyldisiloxane as Si precursors. Amorphous SiOC networks were formed via the condensation of Si-OH groups, the hydrosilylation of Si-H and Si-CH. CH2 groups, and a crosslinking reaction of Si-CH3 groups, respectively. The crosslinking of Si-CH3 groups at temperatures ranging from 600 to 700 degrees C under a N-2 atmosphere was quite effective in constructing a Si-CH2-Si unit without the formation of mesopores, which was confirmed by the results of N-2 adsorption and by the gas permeation properties. The network pore size of the SiOC membrane calcined at 700 degrees C under N-2 showed high oxidative stability at 500 degrees C and was appropriate for the separation of large molecules (H-2/CF4 selectivity: 640, H-2/SF6: 2900, N-2/CF4: 98). A SiOC membrane calcined at 800 degrees C showed H-2/N-2 selectivity of 62, which was approximately 10 times higher than that calcined at 700 degrees C because the SiOC networks were densified by the cleavage and redistribution reactions of Si-C and Si-O groups.

リンク情報
DOI
https://doi.org/10.1021/acsomega.8b00632
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000436340500051&DestApp=WOS_CPL
ID情報
  • DOI : 10.1021/acsomega.8b00632
  • ISSN : 2470-1343
  • Web of Science ID : WOS:000436340500051

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