A multilayer Laue lens (MLL) as a hard X-ray focusing device has been designed and fabricated. Mo/Si and MoSi2/Si were chosen to form the multilayers owing to their superior properties of high diffraction efficiency and relatively sharp interface between layers. DC magnetron sputtering system was used for deposition of the multilayers. The optical properties of the MLL were measured at BL24XU of SPring-8 with 20-keV X-rays. To confirm the dynamical diffraction effect, far-field diffraction images were taken at various incidence angles and depths. The resultant intensity distributions showed similar structure to those expected by calculations. Further, an almost diffraction-limited beam size of around 30 nm was obtained.