Papers

Peer-reviewed
Jul, 2017

Interfacial Manipulation by Rutile TiO2 Nanoparticles to Boost CO2 Reduction into CO on a Metal-Complex/Semiconductor Hybrid Photocatalyst

ACS APPLIED MATERIALS & INTERFACES
  • Keisuke Wada
  • ,
  • Chandana Sampath Kumara Ranasinghe
  • ,
  • Ryo Kuriki
  • ,
  • Akira Yamakata
  • ,
  • Osamu Ishitani
  • ,
  • Kazuhiko Maeda

Volume
9
Number
28
First page
23869
Last page
23877
Language
English
Publishing type
Research paper (scientific journal)
DOI
10.1021/acsami.7b07484
Publisher
AMER CHEMICAL SOC

Metal-complex/semiconductor hybrids have attracted attention as photocatalysts for visible-light CO2 reduction, and electron transfer from the metal complex to the semiconductor is critically important to improve the performance. Here rutile TiO2 nanoparticles having 5-10 nm in size were employed as modifiers to improve interfacial charge transfer between semiconducting carbon nitride nanosheets (NS-C3N4) and a supramolecular Ru(II)-Re(I) binuclear complex (RuRe). The RuRe/TiO2/NS-C3N4 hybrid was capable of photocatalyzing CO2 reduction into CO with high selectivity under visible light (lambda > 400 nm), outperforming an analogue without TiO2 by a factor of 4, in terms of both CO formation rate and turnover number (TON). The enhanced photocatalytic activity was attributed primarily to prolonged lifetime of free and/or shallowly trapped electrons generated in TiO2/NS-C3N4 under visible-light irradiation, as revealed by transient absorption spectroscopy. Experimental results also indicated that the TiO2 modifier served as a good adsorption site for RuRe, which resulted in the suppression of undesirable desorption of the complex, thereby contributing to the improved photocatalytic performance. This study presents the first successful example of interfacial manipulation in a metal-complex/semiconductor hybrid photocatalyst for improved visible-light CO2 reduction to produce CO.

Link information
DOI
https://doi.org/10.1021/acsami.7b07484
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000406172700064&DestApp=WOS_CPL
ID information
  • DOI : 10.1021/acsami.7b07484
  • ISSN : 1944-8244
  • eISSN : 1944-8252
  • Web of Science ID : WOS:000406172700064

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