論文

査読有り
2017年7月

Interfacial Manipulation by Rutile TiO2 Nanoparticles to Boost CO2 Reduction into CO on a Metal-Complex/Semiconductor Hybrid Photocatalyst

ACS APPLIED MATERIALS & INTERFACES
  • Keisuke Wada
  • ,
  • Chandana Sampath Kumara Ranasinghe
  • ,
  • Ryo Kuriki
  • ,
  • Akira Yamakata
  • ,
  • Osamu Ishitani
  • ,
  • Kazuhiko Maeda

9
28
開始ページ
23869
終了ページ
23877
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1021/acsami.7b07484
出版者・発行元
AMER CHEMICAL SOC

Metal-complex/semiconductor hybrids have attracted attention as photocatalysts for visible-light CO2 reduction, and electron transfer from the metal complex to the semiconductor is critically important to improve the performance. Here rutile TiO2 nanoparticles having 5-10 nm in size were employed as modifiers to improve interfacial charge transfer between semiconducting carbon nitride nanosheets (NS-C3N4) and a supramolecular Ru(II)-Re(I) binuclear complex (RuRe). The RuRe/TiO2/NS-C3N4 hybrid was capable of photocatalyzing CO2 reduction into CO with high selectivity under visible light (lambda > 400 nm), outperforming an analogue without TiO2 by a factor of 4, in terms of both CO formation rate and turnover number (TON). The enhanced photocatalytic activity was attributed primarily to prolonged lifetime of free and/or shallowly trapped electrons generated in TiO2/NS-C3N4 under visible-light irradiation, as revealed by transient absorption spectroscopy. Experimental results also indicated that the TiO2 modifier served as a good adsorption site for RuRe, which resulted in the suppression of undesirable desorption of the complex, thereby contributing to the improved photocatalytic performance. This study presents the first successful example of interfacial manipulation in a metal-complex/semiconductor hybrid photocatalyst for improved visible-light CO2 reduction to produce CO.

リンク情報
DOI
https://doi.org/10.1021/acsami.7b07484
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000406172700064&DestApp=WOS_CPL
ID情報
  • DOI : 10.1021/acsami.7b07484
  • ISSN : 1944-8244
  • eISSN : 1944-8252
  • Web of Science ID : WOS:000406172700064

エクスポート
BibTeX RIS