2020年8月31日
High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser
Optics Express
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- 巻
- 28
- 号
- 18
- 開始ページ
- 25706
- 終了ページ
- 25706
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1364/oe.398590
- 出版者・発行元
- The Optical Society
A high-resolution micro channel-cut crystal monochromator (µCCM) composed of an Si(220) crystal is developed for the purpose of narrowing the bandwidth of a reflection self-seeded X-ray free-electron laser. Subsurface damage on the monochromator, which distorts the wavefront and broadens the bandwidth of the monochromatic seed beam, was removed by using a plasma etching technique. High diffraction performance of the monochromator was confirmed through evaluation with coherent X-rays. Reflection self-seeding operation was tested with the Si(220) µCCM at SPring-8 Angstrom Compact free-electron laser. A narrow average bandwidth of 0.6 eV, which is five times narrower than the value previously reported [I. Inoue et al., Nat. Photonics 13, 319 (2019)], was successfully obtained at 9 keV. The narrow-band X-ray beams with high intensity realized in this study will further expand the capabilities of X-ray free-electron lasers.
- リンク情報
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- DOI
- https://doi.org/10.1364/oe.398590
- PubMed
- https://www.ncbi.nlm.nih.gov/pubmed/32906855
- URL
- https://www.osapublishing.org/viewmedia.cfm?URI=oe-28-18-25706&seq=0
- Scopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85090396237&origin=inward 本文へのリンクあり
- Scopus Citedby
- https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85090396237&origin=inward
- ID情報
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- DOI : 10.1364/oe.398590
- eISSN : 1094-4087
- PubMed ID : 32906855
- SCOPUS ID : 85090396237