論文

1999年

光触媒・光表面反応の新展開 シリカの光触媒作用

表面科学
  • 田中 庸裕
  • ,
  • 吉田 寿雄

20
2
開始ページ
73
終了ページ
78
記述言語
日本語
掲載種別
DOI
10.1380/jsssj.20.73
出版者・発行元
The Surface Science Society of Japan

As generally recognized silica is an inert material and therefore chemically stable. Recently, however, there has been increased number of the reports that the chemical activity of silica generated when silica is treated by evacuation at a high temperature. With this regard, the present report is an overview of our work on photocatalysis by silica. The evacu-ation at a high temperature brings about a generation of an active site; possibly an abnormally coordinated silicon atom that is a photoluminescence center as well as a paramagnetic radical center. When the site is in contact with oxygen gas, an O2-anion radical forms by UV light irradiation, which can oxidize alkene molecules and carbon monoxide. In the absence of oxygen, by introduction of alkene molecules to the system involving UV-irradiated silica, alkene metathesis takes place. The metathesis reaction proceeds via. a metalacyclobutane intermediate although the presence of carbene species has not been confirmed yet.

リンク情報
DOI
https://doi.org/10.1380/jsssj.20.73
CiNii Articles
http://ci.nii.ac.jp/naid/130003683921
URL
https://jlc.jst.go.jp/DN/JALC/00059402671?from=CiNii
ID情報
  • DOI : 10.1380/jsssj.20.73
  • ISSN : 0388-5321
  • CiNii Articles ID : 130003683921

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