論文

査読有り 本文へのリンクあり
2021年10月

Adatom-induced dislocation annihilation in epitaxial silicene

2D MATERIALS
  • A. Fleurence
  • ,
  • Y. Yamada-Takamura

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記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1088/2053-1583/ac15da
出版者・発行元
IOP PUBLISHING LTD

The transformation of the stripe domain structure of spontaneously-formed
epitaxial silicene on ZrB$_2$ thin film into a single-domain driven by the
adsorption of a fraction of a monolayer of silicon was used to investigate how
dislocations react and eventually annihilate in a two-dimensional honeycomb
structure. The in-situ real time STM monitoring of the evolution of the domain
structure after Si deposition revealed the mechanisms leading to the nucleation
of a single-domain into a domain structure through a stepwise reaction of
partial dislocations. After its nucleation, the single-domain extends by the
propagation of edge dislocations at its frontiers. The identification of this
particular nucleation-propagation formation of dislocation-free silicene sheet
provides insights into how crystallographic defects can be healed in
two-dimensional materials.

リンク情報
DOI
https://doi.org/10.1088/2053-1583/ac15da
arXiv
http://arxiv.org/abs/arXiv:2010.07519
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000682148100001&DestApp=WOS_CPL
URL
http://arxiv.org/abs/2010.07519v1
URL
http://arxiv.org/pdf/2010.07519v1 本文へのリンクあり
ID情報
  • DOI : 10.1088/2053-1583/ac15da
  • ISSN : 2053-1583
  • arXiv ID : arXiv:2010.07519
  • Web of Science ID : WOS:000682148100001

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