2015年1月
OS1421-208 GLAD法で作製したSIナノらせん要素の引張特性
M&M材料力学カンファレンス
- ,
- ,
- 巻
- 2015
- 号
- 開始ページ
- "OS1421
- 終了ページ
- 208-1"-"OS1421-208-3"
- 記述言語
- 日本語
- 掲載種別
- 出版者・発行元
- 一般社団法人日本機械学会
In order to examine the deformation behavior of a silicon nano-helix grown by the glancing angle deposition technique, tensile experiment was conducted with in-situ scanning electron microscope observation. An isolated nano-helix was prepared by removing neighboring nano-helices using a removable probe, and the top end was connected to a loading tip with an electron beam curing adhesive. The nano-helix was monotonically deformed up to fracture with a large elastic elongation due to the helical shape. It was found that the deformation stiffness of the nano-helix is governed by the geometry. Moreover, the yield stress was evaluated to be τ_γ = 550〜563 MPa.
- リンク情報
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- CiNii Articles
- http://ci.nii.ac.jp/naid/110010053627
- CiNii Books
- http://ci.nii.ac.jp/ncid/AA12322087
- URL
- http://ci.nii.ac.jp/naid/110010053627/
- ID情報
-
- CiNii Articles ID : 110010053627
- CiNii Books ID : AA12322087