論文

2015年1月

OS1421-208 GLAD法で作製したSIナノらせん要素の引張特性

M&M材料力学カンファレンス
  • 澄川 貴志
  • ,
  • 幸下 哲也
  • ,
  • 北村 隆行

2015
開始ページ
"OS1421
終了ページ
208-1"-"OS1421-208-3"
記述言語
日本語
掲載種別
出版者・発行元
一般社団法人日本機械学会

In order to examine the deformation behavior of a silicon nano-helix grown by the glancing angle deposition technique, tensile experiment was conducted with in-situ scanning electron microscope observation. An isolated nano-helix was prepared by removing neighboring nano-helices using a removable probe, and the top end was connected to a loading tip with an electron beam curing adhesive. The nano-helix was monotonically deformed up to fracture with a large elastic elongation due to the helical shape. It was found that the deformation stiffness of the nano-helix is governed by the geometry. Moreover, the yield stress was evaluated to be τ_γ = 550〜563 MPa.

リンク情報
CiNii Articles
http://ci.nii.ac.jp/naid/110010053627
CiNii Books
http://ci.nii.ac.jp/ncid/AA12322087
URL
http://ci.nii.ac.jp/naid/110010053627/
ID情報
  • CiNii Articles ID : 110010053627
  • CiNii Books ID : AA12322087

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