論文

2017年7月

Molecular beam epitaxy growth of SmFeAs(O,F) films with T-c=55 K using the new fluorine source FeF3

JOURNAL OF APPLIED PHYSICS
  • Masahito Sakoda
  • ,
  • Akihiro Ishii
  • ,
  • Kenji Takinaka
  • ,
  • Michio Naito

122
1
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1063/1.4990986
出版者・発行元
AMER INST PHYSICS

REFeAs(O,F) (RE: rare-earth element) has the highest-T-c (similar to 58 K) among the iron-based superconductors, but a thin-film growth of REFeAs(O,F) is difficult. This is because it is not only a complex compound consisting of five elements but also requires doping of highly reactive fluorine to achieve superconductivity. We have reported in our previous article that fluorine can be supplied to a film by subliming solid-state fluorides such as FeF2 or SmF3. In this article, we report on the growth of SmFeAs(O,F) using FeF3 as an alternative fluorine source. FeF3 is solid at ambient temperatures and decomposes at temperatures as low as 100-200 degrees C, and releases fluorine-containing gas during the thermal decomposition. With this alternative fluorine source, we have grown SmFeAs(O,F) films with T-c as high as 55 K. This achievement demonstrates that FeF3 has potential as a fluorine source that can be employed ubiquitously for a thin-film growth of any fluorine containing compounds. One problem specific to FeF3 is that the compound is highly hydroscopic and contains a substantial amount of water even in its anhydrous form. In this article, we describe how to overcome this specific problem. Published by AIP Publishing.

リンク情報
DOI
https://doi.org/10.1063/1.4990986
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000405084900029&DestApp=WOS_CPL
URL
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85022341759&origin=inward
ID情報
  • DOI : 10.1063/1.4990986
  • ISSN : 0021-8979
  • eISSN : 1089-7550
  • SCOPUS ID : 85022341759
  • Web of Science ID : WOS:000405084900029

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