論文

査読有り
2014年7月

Adventitious root formation of Japanese cedar (Cryptomeria japonica D. Don) cuttings is stimulated by soaking basal portion of cuttings in warmed water while cooling their apical portion

NEW FORESTS
  • Toshio Shibuya
  • ,
  • Toru Taniguchi
  • ,
  • Shuhei Tsukuda
  • ,
  • Shuji Shiozaki
  • ,
  • Kaori Itagaki

45
4
開始ページ
589
終了ページ
602
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1007/s11056-014-9414-z
出版者・発行元
SPRINGER

To improve the propagation of Japanese cedar (Cryptomeria japonica D. Don), we investigated the effects of apical and basal temperatures during a water soaking treatment on the adventitious root formation of 70-mm long shoot tip cuttings which have an apical bud. The basal portion of the cuttings was soaked for 28 days in water with temperatures ranging from 10 to 35 A degrees C, at an air temperature of 5 or 10 A degrees C. Control cuttings were soaked in water at 25 A degrees C, with an air temperature of 25 A degrees C. Treated cuttings were then planted in vermiculite rooting medium and grown at an air temperature of 25 A degrees C for 35 days. Adventitious roots initiated earlier and developed more in the cuttings treated with apical temperatures of 5 or 10 A degrees C and basal temperatures of 20-30 A degrees C than in the control cuttings. The rooting percentage was greatest (93 %) in the cuttings treated with a 10/25 A degrees C apical/basal temperature, whereas few control cuttings rooted (13 %). This suggests that the temperature gradient created by warming the basal portion of the cuttings while cooling their apical end stimulates adventitious root formation. When we tested seasonal variation of rootability at 10/25 A degrees C, the rooting percentage increased from early autumn to winter, and decreased from winter to summer. The soluble sugar contents did not directly affect the formation of adventitious roots in the present study.

リンク情報
DOI
https://doi.org/10.1007/s11056-014-9414-z
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000338191100009&DestApp=WOS_CPL
ID情報
  • DOI : 10.1007/s11056-014-9414-z
  • ISSN : 0169-4286
  • eISSN : 1573-5095
  • Web of Science ID : WOS:000338191100009

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