Utilizing the difference in interface strength due to fabrication process, a technique for producing a sharp pre-crack between a thin film and a substrate is proposed. A cracked specimen for examining fracture toughness of interface between a sputtered copper (Cu) thin film and silicon (Si) is made by the method. A vacuum-evaporated Cu thin film, which has poor adhesion to Si, is inserted between the sputtered Cu thin film and the Si substrate as a release layer. The release layer debonds from the Si substrate at very low load, and the sharp pre-crack is successfully introduced along the interface. Using the pre-cracked specimen, the interface fracture toughness test is conducted and the critical J-integral, J(C), is evaluated as about 1 J/m(2) for the sputtered Cu/Si interface. (c) 2005 Elsevier Ltd. All rights reserved.