論文

2016年

Improving thermoelectric properties of bulk Si by dispersing VSi

Jpn. J. Appl. Phys.
  • Yusufu Aikebaier
  • ,
  • Kurosaki Ken
  • ,
  • Ohishi Yuji
  • ,
  • Muta Hiroaki
  • ,
  • Yamanaka Shinsuke

55
6
開始ページ
61301
終了ページ
61301
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.7567/JJAP.55.061301
出版者・発行元
Institute of Physics

In order to enhance the thermoelectric properties of Si-based bulk materials, the lattice thermal conductivity (κ<inf>lat</inf>) should be reduced with little degradation of the electrical properties. Our group had previously demonstrated that the phosphorus (P)-rich nanoscale precipitates formed naturally in heavily P-doped bulk Si scatter phonons more effectively than carriers, resulting in a high figure of merit (ZT) [A. Yusufu et al., Nanoscale 6, 13921 (2014)]. Here, we successfully prepared heavily P-doped bulk Si containing metallic VSi<inf>2</inf>nanoparticles through the ball milling of Si, V, and P and subsequent spark plasma sintering. The VSi<inf>2</inf>nanoparticles did not affect the electrical properties of Si significantly but greatly decreased the κ<inf>lat</inf>, leading to a marked increase in ZT. The maximum ZT value, which was 0.4, was obtained at 1073 K, which is two times higher than that for Si.

リンク情報
DOI
https://doi.org/10.7567/JJAP.55.061301
CiNii Articles
http://ci.nii.ac.jp/naid/150000112579
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000377062700008&DestApp=WOS_CPL
URL
https://publons.com/publon/2028538/
ID情報
  • DOI : 10.7567/JJAP.55.061301
  • ISSN : 0021-4922
  • CiNii Articles ID : 150000112579
  • ORCIDのPut Code : 63789605
  • Web of Science ID : WOS:000377062700008

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