2016年
Improving thermoelectric properties of bulk Si by dispersing VSi
Jpn. J. Appl. Phys.
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- 巻
- 55
- 号
- 6
- 開始ページ
- 61301
- 終了ページ
- 61301
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.7567/JJAP.55.061301
- 出版者・発行元
- Institute of Physics
In order to enhance the thermoelectric properties of Si-based bulk materials, the lattice thermal conductivity (κ<inf>lat</inf>) should be reduced with little degradation of the electrical properties. Our group had previously demonstrated that the phosphorus (P)-rich nanoscale precipitates formed naturally in heavily P-doped bulk Si scatter phonons more effectively than carriers, resulting in a high figure of merit (ZT) [A. Yusufu et al., Nanoscale 6, 13921 (2014)]. Here, we successfully prepared heavily P-doped bulk Si containing metallic VSi<inf>2</inf>nanoparticles through the ball milling of Si, V, and P and subsequent spark plasma sintering. The VSi<inf>2</inf>nanoparticles did not affect the electrical properties of Si significantly but greatly decreased the κ<inf>lat</inf>, leading to a marked increase in ZT. The maximum ZT value, which was 0.4, was obtained at 1073 K, which is two times higher than that for Si.
- リンク情報
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- DOI
- https://doi.org/10.7567/JJAP.55.061301
- CiNii Articles
- http://ci.nii.ac.jp/naid/150000112579
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000377062700008&DestApp=WOS_CPL
- URL
- https://publons.com/publon/2028538/
- ID情報
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- DOI : 10.7567/JJAP.55.061301
- ISSN : 0021-4922
- CiNii Articles ID : 150000112579
- ORCIDのPut Code : 63789605
- Web of Science ID : WOS:000377062700008