2018年1月1日
Fabrication of nitrogen-containing diamond-like carbon film by filtered arc deposition as conductive hard-coating film
Japanese Journal of Applied Physics
- 巻
- 57
- 号
- 1
- 記述言語
- 英語
- 掲載種別
- 研究論文(国際会議プロシーディングス)
- DOI
- 10.7567/JJAP.57.01AE07
- 出版者・発行元
- Japan Society of Applied Physics
Diamond-like carbon (DLC) films, which are amorphous carbon films, have been used as hard-coating films for protecting the surface of mechanical parts. Nitrogen-containing DLC (N-DLC) films are expected as conductive hard-coating materials. N-DLC films are expected in applications such as protective films for contact pins, which are used in the electrical check process of integrated circuit chips. In this study, N-DLC films are prepared using the T-shaped filtered arc deposition (T-FAD) method, and film properties are investigated. Film hardness and film density decreased when the N content increased in the films because the number of graphite structures in the DLC film increased as the N content increased. These trends are similar to the results of a previous study. The electrical resistivity of N-DLC films changed from 0.26 to 8.8 Ω cm with a change in the nanoindentation hardness from 17 to 27 GPa. The N-DLC films fabricated by the T-FAD method showed high mechanical hardness and low electrical resistivity.
- リンク情報
- ID情報
-
- DOI : 10.7567/JJAP.57.01AE07
- ISSN : 1347-4065
- ISSN : 0021-4922
- SCOPUS ID : 85040017233
- Web of Science ID : WOS:000418412100031