2021年5月13日
Measurement of the density and rotational temperature of OH in a saturated water vapor slot-excited microwave plasma
Journal of Physics D: Applied Physics
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- ,
- ,
- 巻
- 54
- 号
- 19
- 記述言語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1088/1361-6463/abe440
OH density and rotational temperature were measured in a saturated water vapor slot-excited microwave plasma using spatio-temporally resolved laser-induced fluorescence. The microwave power was 20-100 W under continuous wave mode, whereas 40-200 W peak under pulse-modulated mode (30% duty cycle, 100 Hz). The water vapor pressure was 2.3 kPa. An approximately 2 mm thick flat-shaped plasma was generated on the surface of a slot antenna. The OH density and rotational temperature in the plasma ranged from 1 × 1014 cm-3 to 1 × 1015 cm-3 and from 1100 K to 3000 K, respectively. OH was produced via various routes originating from electron collisions (e + H2O) and was primarily lost through recombination (OH+OH → H2O+O) and diffusion. The production rate (k p ) of OH per H2O molecule, which was calculated based on a simplified reaction model using the measured OH density and temperature, showed a relation of, where P represents the microwave power. This relationship implies a two-step production process of OH via the vibrational excitation of H2O. Although the OH density increased with increasing microwave power, the density became saturated at high power values.
- リンク情報
- ID情報
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- DOI : 10.1088/1361-6463/abe440
- ISSN : 0022-3727
- eISSN : 1361-6463
- SCOPUS ID : 85102659901