1993年9月
FORMATION OF CRYSTALLINE SIC BURIED LAYER BY HIGH-DOSE IMPLANTATION OF MEV CARBON-IONS AT HIGH-TEMPERATURE
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
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- 巻
- 32
- 号
- 9A
- 開始ページ
- L1286
- 終了ページ
- L1288
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- 出版者・発行元
- JAPAN SOC APPLIED PHYSICS
A buried layer of crystalline SiC in silicon wafer is synthesized by 1.5 MeV C+ implantation at a dose of 1.5 x 10(18) ions/cm2 at a high temperature of 880-degrees-C. The infrared absorption spectrum and the X-ray diffraction pattern of this sample show formation of 3C-type SiC crystal. The pole figures of X-ray diffraction show that crystallographic orientation of the SiC buried layer is aligned along the lattice of the Si substrate, that is, topotaxial internal growth of crystalline SiC occurs in a single crystal of Si during the high-temperature ion implantation.
- リンク情報
- ID情報
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- ISSN : 0021-4922
- Web of Science ID : WOS:A1993LX13300032