論文

査読有り
2018年5月1日

Relative secondary ion yields produced by vacuum-type electrospray droplet ion beams

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
  • Satoshi Ninomiya
  • ,
  • Lee Chuin Chen
  • ,
  • Kenzo Hiraoka

36
3
開始ページ
03F134-1
終了ページ
03F134-8
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1116/1.5019182
出版者・発行元
AVS Science and Technology Society

The relatively new electrospray droplet impact method is based on electrospray at atmospheric pressure and has been successful in achieving efficient desorption/ionization of biological molecules, soft etching of polymers, and nonselective etching of metal oxides. However, the beam current and brightness of this method are not practical for surface analyses. To improve the performance of this method, the authors have developed a new droplet ion beam gun using an electrospray of aqueous solutions in a vacuum. This technique could be expected to be a high-intensity massive cluster ion beam and they evaluate the performance of the vacuum-type electrospray droplet ion (V-EDI) gun. In this study, V-EDI and gas cluster ion beam guns were installed in a time-of-flight analyzer to directly compare the relative secondary ion yields of several biomolecules produced by several cluster ion beams.

リンク情報
DOI
https://doi.org/10.1116/1.5019182
ID情報
  • DOI : 10.1116/1.5019182
  • ISSN : 2166-2754
  • ISSN : 2166-2746
  • SCOPUS ID : 85047015417

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