2017年7月
Ultrahigh-Q photonic crystal nanocavities fabricated by CMOS process technologies
OPTICS EXPRESS
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- 巻
- 25
- 号
- 15
- 開始ページ
- 18165
- 終了ページ
- 18174
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1364/OE.25.018165
- 出版者・発行元
- OPTICAL SOC AMER
We fabricated photonic crystal high-quality factor (Q) nanocavities on a 300-mm-wide silicon-on-insulator wafer by using argon fluoride immersion photolithography. The heterostructure nanocavities showed an average experimental Q value of 1.5 million for 12 measured samples. The highest Q value was 2.3 million, which represents a record for a nanocavity fabricated by complementary metal-oxide-semiconductor (CMOS)-compatible machinery. We also demonstrated an eight-channel drop filter with 4 nm spacing consisting of arrayed nanocavities with three missing air holes. The standard deviation in the drop wavelength was less than 1 nm. These results will accelerate ultrahigh-Q nanocavity research in various areas. (C) 2017 Optical Society of America
- リンク情報
- ID情報
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- DOI : 10.1364/OE.25.018165
- ISSN : 1094-4087
- Web of Science ID : WOS:000408584400118