MISC

2008年9月

Sonocatalytic facilitation of hydroxyl radical generation in the presence of TiO(2)

ULTRASONICS SONOCHEMISTRY
  • Nobuaki Shimizu
  • ,
  • Chiaki Ogino
  • ,
  • Mahmoud Farshbaf Dadjour
  • ,
  • Kazuaki Ninomiya
  • ,
  • Atsushi Fujihira
  • ,
  • Kazumichi Sakiyama

15
6
開始ページ
988
終了ページ
994
記述言語
英語
掲載種別
DOI
10.1016/j.ultsonch.2008.04.011
出版者・発行元
ELSEVIER SCIENCE BV

The generation of hydroxyl (CH) radicals was investigated during ultrasonic irradiation and in the presence of TiO(2). The effect of TiO(2) on an ultrasonic system's oxidation power was evaluated by examining the oxidation of salicylic acid. The generation of the salicylic acid derivatives, 2,3-dihydroxybenzoic acid (DHBA) and 2,5-DHBA, was measured by high-performance liquid chromatography coupled with electro-chemical detection under different experimental conditions. The presence of TiO(2) enhanced the generation of DHBA during ultrasonic irradiation, thus indicating a higher oxidation power in the ultrasonic system. Al(2)O(3) also increased the generation of DHBA during irradiation; however, the effect of TiO(2) was found to be higher than that of Al(2)O(3). The addition of OH radical scavengers such as dimethylsulfoxide (DMSO), methanol and mannitol significantly suppressed the production of DHBA, and DMSO was found to have the highest suppressive effect among all scavengers. The effects of dissolved gases on the generation of OH radicals were further studied, and their power was found to be in the order Xe > At > O(2) > N(2). The degassing of the irradiation solution completely suppressed the generation of CH radicals. These results indicate that the presence of TiO(2) accelerates the generation of OH radicals during ultrasonic irradiation, and that the process may be mediated through the induction of cavitation bubbles in irradiating solutions. (c) 2008 Elsevier B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.ultsonch.2008.04.011
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000257517200012&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.ultsonch.2008.04.011
  • ISSN : 1350-4177
  • Web of Science ID : WOS:000257517200012

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