2005年
Scanning Tunneling Microscopy observation of individual boron dopant atoms beneath Si(001)-2 x 1 surfaces
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
- ,
- ,
- 巻
- 44
- 号
- 46-49
- 開始ページ
- L1436
- 終了ページ
- L1438
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1143/JJAP.44.L1436
- 出版者・発行元
- INST PURE APPLIED PHYSICS
Individual B dopant atoms residing beneath Si(001)-2 x 1 surfaces have been detected by scanning tunneling microscopy (STM). A subsurface B atom appears as a broad protrusion in filled-state images, while it appears as either a broad depression or a localized protrusion in empty-state images depending on the STM tip condition. This variation in dopant appearance is attributed to the different work function (WF) of the tip, i.e., the amount of tip-induced band bending differs depending on the tip WF, resulting in a different tunneling path and an opposite dopant appearance under the same bias voltage.
- リンク情報
- ID情報
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- DOI : 10.1143/JJAP.44.L1436
- ISSN : 0021-4922
- CiNii Articles ID : 10016873301
- Web of Science ID : WOS:000234091600014