2017年
Mechanism of Low Temperature Oxidation of 4H-SiC by Nitric Acid Vapor Oxidation Method at 600 degrees C
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
- ,
- ,
- 巻
- 6
- 号
- 9
- 開始ページ
- P578
- 終了ページ
- P581
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1149/2.0071709jss
- 出版者・発行元
- ELECTROCHEMICAL SOC INC
Oxidation of 4H-SiC proceeds at 600 degrees C by use of nitric acid vapor. The plots of the SiO2 thickness vs. the square root of the oxidation time are linear, indicating that diffusion of oxidizing species is the rate-determining step. The initial oxidation rate of the C-faced surfaces is 3 times higher than that of the Si-faced surfaces. It is found from cross-sectional transmission electron micrography (TEM) measurements that the SiO2 thickness is uniform and steps originating from miss-orientation from the (000-1) direction having 0.25 nm height are present before and after oxidation, showing that oxidation of SiC proceeds only from step-edges along the (-1100) direction for the C-face and the (1-100) direction for the Si-face. (c) The Author(s) 2017. Published by ECS. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1149/2.0071709jss
- ISSN : 2162-8769
- Web of Science ID : WOS:000418363500017