2015年
Electrochemical Formation of Ca-Si in Molten CaCl2-KCl
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- ,
- ,
- 巻
- 162
- 号
- 4
- 開始ページ
- D186
- 終了ページ
- D191
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1149/2.1021504jes
- 出版者・発行元
- ELECTROCHEMICAL SOC INC
Electrochemical formation of a Ca-Si film in a molten CaCl2-KCl at 923 K was investigated. Potentiostatic electrolysis of a Si electrode at -0.10 V for 1 h resulted in the formation of a multiphase Ca-Si film having a thickness of about 30 mu m. The Ca-Si film was converted into other alloy phases by anodic potentiostatic electrolysis after the cathodic electrodeposition of Ca metal at -0.10 V. The various transformation reactions and the corresponding equilibrium potentials were clarified. At 923 K, the equilibrium potential was found to be 0.18 V (CaSi2). Reflectance measurements in the ultraviolet, visible, and near-infrared region clarified that the CaSi2 film has a direct bandgap of 3.1 eV. (C) The Author(s) 2015. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1149/2.1021504jes
- ISSN : 0013-4651
- eISSN : 1945-7111
- Web of Science ID : WOS:000349827200066