MISC

査読有り
2010年

EVALUATION OF PIEZORESISTANCE COEFFICIENTS OF SILICON NANOSHEETS ON THE BASIS OF FIRST-PRINCIPLES BAND STRUCTURES

MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST
  • Koichi Nakamura
  • ,
  • Toshiyuki Toriyama
  • ,
  • Susumu Sugiyama

開始ページ
436
終了ページ
439
記述言語
英語
掲載種別
DOI
10.1109/MEMSYS.2010.5442473
出版者・発行元
IEEE

We have simulated piezoresistance coefficients in single-crystal hydrogen-terminated silicon nanosheets with (001) surface orientation on the basis of first-principles calculations of model structures. The [110] uniaxial tensile stress causes band deformation, and a drastic change of conductivity can be observed for nanosheet models. We have obtained high piezoresistance coefficients for p-type nanosheet of about 1 nm thickness, pi([110]) = 174 x 10(-11) Pa-1, and pi([110]) = -139 x 10(-11) Pa-1. It is expected that p-type ultra-thin Si(001) nanosheet will be a suitable candidates for nanoscale piezoresistors due to its giant piezoresistivity.

リンク情報
DOI
https://doi.org/10.1109/MEMSYS.2010.5442473
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000278416400107&DestApp=WOS_CPL
ID情報
  • DOI : 10.1109/MEMSYS.2010.5442473
  • ISSN : 1084-6999
  • Web of Science ID : WOS:000278416400107

エクスポート
BibTeX RIS