2010年
EVALUATION OF PIEZORESISTANCE COEFFICIENTS OF SILICON NANOSHEETS ON THE BASIS OF FIRST-PRINCIPLES BAND STRUCTURES
MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST
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- 開始ページ
- 436
- 終了ページ
- 439
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1109/MEMSYS.2010.5442473
- 出版者・発行元
- IEEE
We have simulated piezoresistance coefficients in single-crystal hydrogen-terminated silicon nanosheets with (001) surface orientation on the basis of first-principles calculations of model structures. The [110] uniaxial tensile stress causes band deformation, and a drastic change of conductivity can be observed for nanosheet models. We have obtained high piezoresistance coefficients for p-type nanosheet of about 1 nm thickness, pi([110]) = 174 x 10(-11) Pa-1, and pi([110]) = -139 x 10(-11) Pa-1. It is expected that p-type ultra-thin Si(001) nanosheet will be a suitable candidates for nanoscale piezoresistors due to its giant piezoresistivity.
- リンク情報
- ID情報
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- DOI : 10.1109/MEMSYS.2010.5442473
- ISSN : 1084-6999
- Web of Science ID : WOS:000278416400107