MISC

2002年9月

Micromechanical analysis of silicon nitride: a comparative study by fracture mechanics and Raman microprobe spectroscopy

JOURNAL OF RAMAN SPECTROSCOPY
  • S Tochino
  • ,
  • G Pezzotti

33
9
開始ページ
709
終了ページ
+
記述言語
英語
掲載種別
DOI
10.1002/jrs.901
出版者・発行元
JOHN WILEY & SONS LTD

Raman microprobe spectroscopy was used to characterize in situ microstress fields which develop during fracture of a toughened silicon nitride (Si3N4) polycrystal. Maps of microscopic stress were collected in the neighborhood of a propagating crack both at zero and at critical loading conditions. Micromechanics results by Raman spectroscopy were analyzed and compared with conventional fracture mechanics assessments, such as the evaluation of rising R-curve behavior and crack opening displacement. Outcomes of these assessments illustrate that, despite the approximations involved in the piezo-spectroscopic equations used for calculating the microstress field from a local Raman shift, Raman microprobe spectroscopy is a viable method for semi-quantitative investigations of microfracture mechanisms in advanced ceramic materials. Copyright (C) 2002 John Wiley Sons, Ltd.

リンク情報
DOI
https://doi.org/10.1002/jrs.901
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000178398200004&DestApp=WOS_CPL
ID情報
  • DOI : 10.1002/jrs.901
  • ISSN : 0377-0486
  • Web of Science ID : WOS:000178398200004

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