2002年9月
Micromechanical analysis of silicon nitride: a comparative study by fracture mechanics and Raman microprobe spectroscopy
JOURNAL OF RAMAN SPECTROSCOPY
- ,
- 巻
- 33
- 号
- 9
- 開始ページ
- 709
- 終了ページ
- +
- 記述言語
- 英語
- 掲載種別
- DOI
- 10.1002/jrs.901
- 出版者・発行元
- JOHN WILEY & SONS LTD
Raman microprobe spectroscopy was used to characterize in situ microstress fields which develop during fracture of a toughened silicon nitride (Si3N4) polycrystal. Maps of microscopic stress were collected in the neighborhood of a propagating crack both at zero and at critical loading conditions. Micromechanics results by Raman spectroscopy were analyzed and compared with conventional fracture mechanics assessments, such as the evaluation of rising R-curve behavior and crack opening displacement. Outcomes of these assessments illustrate that, despite the approximations involved in the piezo-spectroscopic equations used for calculating the microstress field from a local Raman shift, Raman microprobe spectroscopy is a viable method for semi-quantitative investigations of microfracture mechanisms in advanced ceramic materials. Copyright (C) 2002 John Wiley Sons, Ltd.
- リンク情報
- ID情報
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- DOI : 10.1002/jrs.901
- ISSN : 0377-0486
- Web of Science ID : WOS:000178398200004