論文

査読有り
2016年9月

Incident energy and charge deposition dependences of electron transmission through a microsized tapered glass capillary

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
  • S. J. Wickramarachchi
  • ,
  • T. Ikeda
  • ,
  • B. S. Dassanayake
  • ,
  • D. Keerthisinghe
  • ,
  • J. A. Tanis

382
開始ページ
60
終了ページ
66
記述言語
英語
掲載種別
研究論文(学術雑誌)
DOI
10.1016/j.nimb.2016.06.006
出版者・発行元
ELSEVIER SCIENCE BV

An experimental study of electron transmission and guiding through a tapered glass capillary has been performed. Electrons were transmitted for tilt angles up to similar to 6.5 degrees and similar to 9.5 degrees (laboratory angles) for incident energies of 500 and 1000 eV, respectively. It is found that elastic and inelastic contributions give rise to distinguishable peaks in the transmitted profile. For 500 eV elastic transmission dominates the profile, while for 1000 eV both elastic and inelastic contributions are present. The transmission for both energies was studied as a function of the charge (time) deposition and found to be strongly dependent. Results suggest fundamental differences between 500 and 1000 eV incident electrons. For 500 eV the transmission slowly increases suggesting charge up of the capillary wall, reaching relative stability with infrequent breakdowns for all angles investigated. For 1000 eV for tilt angles near zero degrees the time dependent profile shows oscillations in the transmission, which never reached a stable condition, while for the larger angle investigated the transmission reached near equilibrium. Inelastic processes dominated the transmission for 1000 eV even at very small tilt angles, but was generally elastic (due to Coulomb deflection) for 500 eV even for the largest tilt angle measured. (C) 2016 Elsevier B.V. All rights reserved.

リンク情報
DOI
https://doi.org/10.1016/j.nimb.2016.06.006
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000382413500012&DestApp=WOS_CPL
ID情報
  • DOI : 10.1016/j.nimb.2016.06.006
  • ISSN : 0168-583X
  • eISSN : 1872-9584
  • Web of Science ID : WOS:000382413500012

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