2018年
Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
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- 巻
- 31
- 号
- 2
- 開始ページ
- 221
- 終了ページ
- 225
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.2494/photopolymer.31.221
- 出版者・発行元
- TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN
We synthesized tannic acid derivatives with pendant cyclohexyl acetal moieties (TA-CVEn), butyl acetal moieties (TA-BVEn), and adamantyl ester moieties (TA-AD(n)) by the reaction of tannnic acid (TA) with cyclohexyl vinyl ether (CVE), butyl vinyl ether (BVE), and adamantyl bromo acetate (AD) in various feeds ratios. The synthesized TA-CVEn, TA-BVEn, and TA-AD(n) had good solubility, good film-forming ability, and high thermal stability relevant to application of photolithography materials. However, only TA-BVE97 and TA-AD(74) can be used as positive-type photo-resist materials using 2.38 wt% TMAH aq. as developer due to the result of thickness loss property. Furthermore, their resist-sensitivity upon EUV exposure tool and etching durability were adequate and they have high potential as next-generation resist material for EUV photolithography.
- リンク情報
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- DOI
- https://doi.org/10.2494/photopolymer.31.221
- Web of Science
- https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:000440124400013&DestApp=WOS_CPL
- Scopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85053147620&origin=inward 本文へのリンクあり
- Scopus Citedby
- https://www.scopus.com/inward/citedby.uri?partnerID=HzOxMe3b&scp=85053147620&origin=inward
- ID情報
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- DOI : 10.2494/photopolymer.31.221
- ISSN : 0914-9244
- eISSN : 1349-6336
- SCOPUS ID : 85053147620
- Web of Science ID : WOS:000440124400013