2012年5月
Ge Flat Layer Growth on Heavily Phosphorus-Doped Si(001) by Sputter Epitaxy
JAPANESE JOURNAL OF APPLIED PHYSICS
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- 巻
- 51
- 号
- 5
- 開始ページ
- 55502
- 終了ページ
- 055502-4
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1143/JJAP.51.055502
- 出版者・発行元
- JAPAN SOC APPLIED PHYSICS
We have investigated layer-by-layer Ge growth methods on phosphorus (P)-doped Si(001) with our sputter epitaxy method at a growth temperature (T-G) of 350 degrees C. With the sputter epitaxy method, relaxed Ge islands are formed on P-doped 3.5 Omega cm Si with Ge-Si intermixing at the Ge/Si interface; however, a partially strained flat Ge layer is grown directly on P-doped 0.015 Omega cm Si. For comparison with a gas-source molecular beam epitaxy (GS-MBE) method using GeH4, Ge islands are formed on 0.015 Omega cm Si at T-G = 350 degrees C. It has been suggested that the P dopants together with the sputter epitaxy method effectively suppress Ge islanding and induce Ge layer-by-layer growth. (C) 2012 The Japan Society of Applied Physics
- リンク情報
- ID情報
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- DOI : 10.1143/JJAP.51.055502
- ISSN : 0021-4922
- CiNii Articles ID : 40019280493
- Web of Science ID : WOS:000303930200035