2005年6月
Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation
SURFACE & COATINGS TECHNOLOGY
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- 巻
- 196
- 号
- 1-3
- 開始ページ
- 39
- 終了ページ
- 43
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1016/j.surfcoat.2004.08.088
- 出版者・発行元
- ELSEVIER SCIENCE SA
Two formation methods of nanoparticles distributed at a certain depth in a delta layer by negative ion implantation were investigated. Such delta layer formation of isolated metal nanoparticles is desired in a very thin gate oxide film, with thickness of less than 10 nm for the development of a single electron device using nanoparticles as very small capacitance for Coulomb blockade. We have tried two methods by metal negative ion implantation in a thermally grown SiO2 film on Si substrate and postannealing for (1) a delta layer formation of gold nanoparticles in the surface region of SiO2 film, and for (2) a delta layer formation of silver nanoparticles in the bottom region of SiO2 film. In the former with gold negative ion implantation with a low energy, the depth distribution of nanoparticles formed at annealing at less than 900 degrees C depended on depth deviation of implanted atoms. The almost delta layer of Au nanoparticles with diameters of 4-8 nm was obtained just under the surface by Au negative ion implantation at 1 keV and annealing at 900 degrees C. In the latter with silver negative ion implantation at 10 keV, 1 x 10(15) ions/cm(2), 25-nm-thick SiO2/Si, and annealing at 700 degrees C, Ag nanoparticles with a diameter of 6-8 nm were aligned at the same depth in a delta layer in the bottom region of the SiO2 at a distance of 2 nm from the boundary. (c) 2004 Elsevier B.V. All rights reserved.
- リンク情報
- ID情報
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- DOI : 10.1016/j.surfcoat.2004.08.088
- ISSN : 0257-8972
- Web of Science ID : WOS:000229375600009