論文

1997年6月

Ab initio molecular-orbital study on the surface reactions of methane and silane plasma chemical vapor deposition

PHYSICAL REVIEW B
  • K Sato
  • ,
  • H Haruta
  • ,
  • Y Kumashiro

55
23
開始ページ
15467
終了ページ
15470
記述言語
英語
掲載種別
研究論文(学術雑誌)
出版者・発行元
AMERICAN PHYSICAL SOC

Hydrogen-elimination reactions on the substrate surface of methane plasma are studied on the basis of an ab initio molecular-orbital method. The activation energy of the reaction of the rate determining step (by MP2/3-21G//HF/3-21G) is much higher than the analogous reaction in silane plasma. In the case of carbon surface reactions, the activation energy becomes larger; as the model cluster size becomes larger, while in the case of silicon surface reactions,the activation energy becomes lower as the model cluster size becomes larger. Thermodynamically, the relative stability of the reactant and the product of the hydrogen elimination reaction on the substrate surface of methane plasma are similar to that of silane plasma. Thus the methane plasma surface reactions are expected to be qualitatively different from silane plasma surface reactions at low substrate temperatures, while they are expected to be similar at high substrate temperatures.

リンク情報
Web of Science
https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=JSTA_CEL&SrcApp=J_Gate_JST&DestLinkType=FullRecord&KeyUT=WOS:A1997XH33500034&DestApp=WOS_CPL
ID情報
  • ISSN : 0163-1829
  • Web of Science ID : WOS:A1997XH33500034

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