Yukio Watanabe - My portal

Profile Information

Affiliation: Professor, Former Institution / Organization Kyushu University Faculty of Information Science Electrical Engineering Department of Electronic Device Engineering

Degree: Doctor of Engineering(Kyushu University)

J-GLOBAL ID: 200901078618263875
researchmap Member ID: 1000042055

Research Interests

Research Areas

Research History

1972 - 1981

Kyushu University
1972 - 1981

Kyushu University, Associate Professor
1981

- 九州大学教授
1981

- Kyushu University, Professor
1969 - 1972

Kyushu University
1969 - 1972

Kyushu University, Lecturer

Education

- 1969

Kyushu University
- 1969

Graduate School, Division of Engineering, Kyushu University
- 1964

School of Engineering, Kyushu University
- 1964

Faculty of Engineering, Kyushu University

Committee Memberships

Misc.

214

Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films

Thin Solid Films, 427 (1-2) 1-5, 2003
The changes in particle charge distribution during rapid growth of particles in the plasma reactor

KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani

JOURNAL OF COLLOID AND INTERFACE SCIENCE, 257(2) 195-207, Jan, 2003
Cluster-Controlled Plasma CVD for Si Thin Film Solar Cell of High Conversion Efficiency

SHIRATANI Masaharu, KOGA Kazunori, WATANABE Yukio

Jitsumu Hyomen Gijutsu, 54 (12) 931-934(12) 931-934, 2003
ナノクラスタ制御プラズマCVDによる光安定a-Si:H薄膜作製と膜質評価

九州大学中央分析センターセンターニュース, 79,12-20, 2003
シランプラズマ中のクラスタ成長と薄膜形成

信学技報, ED2003-14., 2003
Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films

Thin Solid Films, 427 (1-2) 1-5, 2003
The changes in particle charge distribution during rapid growth of particles in the plasma reactor

KS Kim, DJ Kim, JH Yoon, JY Park, Y Watanabe, M Shiratani

JOURNAL OF COLLOID AND INTERFACE SCIENCE, 257(2) 195-207, Jan, 2003
Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

K Takenaka, M Shiratani, M Onishi, M Takeshita, T Kinoshita, K Koga, Y Watanabe

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 5(2-3) 301-304, Apr, 2002
Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

K Takenaka, M Shiratani, M Onishi, M Takeshita, T Kinoshita, K Koga, Y Watanabe

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 5(2-3) 301-304, Apr, 2002
Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films

K Koga, M Kai, M Shiratani, Y Watanabe, N Shikatani

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 41(2B) L168-L170, Feb, 2002
Cluster-suppressed plasma chemical vapor deposition method for high quality hydrogenated amorphous silicon films

K Koga, M Kai, M Shiratani, Y Watanabe, N Shikatani

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 41(2B) L168-L170, Feb, 2002
Conformal deposition of pure Cu thin films in trenches by H-assisted plasma CVD using Cu(EDMDD)₂

Proceedings of 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 374-375, 2002
Effects of excitaion frequency on cluster amount in silane high-frequency discharges

Proceedings of 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 2, 323-324, 2002
Correlation between Si cluster amount in silane HF discharges and quality of a-Si:H films

Proceedings of 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 2, 323-324, 2002
Anisotropic deposition of Cu with H-assisted plasma CVD

Proceedings of 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 2, 199-200, 2002
Carbon nano-particles due to interaction between H₂ Plasmas and carbon wall

Proceedings of 16th European Conference on Atomic & Molecular Physics of Ionized Gases/5th International Conference on Reactive Plasmas, 1, 173-174, 2002
H Assisted Control of Quality and Conformality in CU Film Deposition Using Plasma CVD Method

Proceedings of ULSI XVI Conference, 271-276, 2002
Suppression method of cluster growth in silane discharges and their application to deposition of super high quality a-Si:H films

Proceedings of International Workshop on Informations & Electrical Engineering 2002, 238-243, 2002
Deposition of Cu films in trenches for LSI interconnects by H assisted plasma CVD method

Proceedings of International Workshop on Informations & Electrical Engineering 2002, 227-232, 2002
放電プラズマ焼結法によるZnO-TiO₂-NiO系セラミックスにおける顕著なPTCR特性の出現（共著）鹿谷昇、前田英司、小松将博

粉体および粉末治金, 49(7), 581-587, 2002

Books and Other Publications

Residual Stress in Cu Films Deposited by H-Assisted Plasma CVD Using Cu(EDMDD)2

Proc. 2003 International Symposium on Dry Process, 2003
Deposition of Nano-Cluster-Dispersed a-Si:H Films using H2+SiH4 Twin Discharges

Proc. International Symposium on Information Science and Electrical Engineering 2003, 2003
Conformal and Anisotropic Deposition of Cu in Trenches by using H-Assisted Plasma CVD Method

Proc. International Symposium on Information Science and Electrical Engineering 2003, 2003
Deposition of a-Si:H films of high stability by cluster-suppressed plasma CVD

Proc. Int. Symp. Plasma Chemistry, 2003
Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges

MRS Symp. Proc., 2003
Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches

MRS Symp. Proc., 2003
VHFプラズマCVDによる結晶シリコンナノ粒子の生成と膜への取り込み

第30回アモルファス物質の物性と応用セミナーテキスト, 2003
Residual Stress in Cu Films Deposited by H-Assisted Plasma CVD Using Cu(EDMDD)2

Proc. 2003 International Symposium on Dry Process, 2003
Deposition of Nano-Cluster-Dispersed a-Si:H Films using H2+SiH4 Twin Discharges

Proc. International Symposium on Information Science and Electrical Engineering 2003, 2003
Conformal and Anisotropic Deposition of Cu in Trenches by using H-Assisted Plasma CVD Method

Proc. International Symposium on Information Science and Electrical Engineering 2003, 2003
Deposition of a-Si:H films of high stability by cluster-suppressed plasma CVD

Proc. Int. Symp. Plasma Chemistry, 2003
Effects of Excitation Frequency and H2 Dilution on Cluster Generation in Silane High-Frequency Discharges

MRS Symp. Proc., 2003
Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches

MRS Symp. Proc., 2003
最新プラズマ発生技術

アイ・ピー・シー, 1991

Professional Memberships

Works

Research Projects

プラズマCVD法を用いた集積回路内銅配線形成

先端技術開発研究, 1995
Cu interconnects in LSI using plasma CVD method

1995
プロセスプラズマ中の微粒子生成・挙動とその応用

先端技術開発研究, 1989
プロセシングプラズマ中の反応制御

先端技術開発研究, 1989
Formation and behavior of particles in processing plasmas and their applications

0103 (Japanese Only), 1989
Reaction Control in Processing Plasma

0103 (Japanese Only), 1989
プラズマCVD法を用いた超LSI用銅配線技術
プラズマ中のパーティクルの挙動制御
プラズマを用いた機能性パーティクル生成・処理技術
太陽電池用高品質アモルファスシリコン膜の高速作製
Cu interconnection in ULSI using plasma CVD method
Behavior control of dust particles in plasmas
Production of functional particles using plasmas
High-rate deposition of high-quality amorphous silicon for solar cell