2008年12月
High-performance MgO thin films for PDPs with a high-rate sputtering-deposition process
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY
- 巻
- 16
- 号
- 12
- 開始ページ
- 1195
- 終了ページ
- 1201
- 記述言語
- 英語
- 掲載種別
- 研究論文(学術雑誌)
- DOI
- 10.1889/JSID16.12.1195
- 出版者・発行元
- SOC INFORMATION DISPLAY
A high-rate sputtering-deposition process for MgO thin films for PDP fabrication was recently developed. The deposition rate of the MgO thin film was about 300 nm/min which shows the possibility of production-line application. The MgO film deposited in this work has a higher density than that of other deposition processes such as electron-beam deposition and shows good discharge characteristics including firing voltage and discharge formation. These were achieved by controlling the stoichiometry and/or the impurity doping during the sputtering process.
- リンク情報
- ID情報
-
- DOI : 10.1889/JSID16.12.1195
- ISSN : 1071-0922
- Web of Science ID : WOS:000262881100004